Advanced Energy announced the launch of a comprehensive RF power transmission solution that combines an advanced digital control power supply with a precise digital impedance matching network. Designed for thin-film industrial applications, the ALTA  platform offers superior adaptability, control accuracy and repeatability, enhancing process stability and providing optimal productivity.

     The ALTA platform includes a 13.56MHz rack-mounted power supply with a power range of 1.5KW to 6KW, and a 13.56MHz tapped digital matching network. The series is optimized for precision, reliability and repeatability of plasma processes in different industries. These industries include solar panels, flat panel displays, precision optics and automotive glass manufacturing.

     "As thin-film manufacturing technology evolves and rapid plasma conversion becomes the norm, there is a growing demand for power solutions that combine precise RF control and dynamic response to rapid plasma conversion," said Dhaval Dhayatkar, senior Marketing Director of Plasma Power Products at Advanced Energy. "The ALTA power supply offers several advanced features, including frequency adjustment, real-time power and impedance measurement, tight power regulation, arc management and phase synchronization."

     The ALTA power supply also enables full digital control and dynamic response to rapid plasma changes, ensuring robust, reliable power transmission. The ALTA matching network provides tuning diversity with its multi-connector coil system that can be easily tuned to accommodate different impedance ranges. The repeated response capability minimizes power deviations between each matcher and between repeated processes.

     By leveraging advanced digital architecture, the ALTA platform enables extremely accurate process measurement and control, as well as seamless integration with state-of-the-art communication interfaces such as EtherCAT and Profinet.